·In Mar. 1999, established and listed on Shanghai Stock Exchange (Stock Code: 600206)
·In Feb. 2001, startup of China 's first 200mm silicon polished wafer production line.
·In Jun.2001, Guotal Semiconductor Materials Co., Ltd. was established in Linhe Industrial Development Zone, Shunyi District, Beijing
·In Nov. 2002, make out the first 450mm CZ silicon monocrystal in china
·In Feb. 2005, "150mm arsenic heavy-doped silicon monocrytal and polished wafers" won the first prize of Beijing Science and Technology Progress
·In Nov. 2005, arsenic heavy-doped silicon monocrystal and polished wafers won the second prize of National Science and Technology Progress
·In Feb. 2006, selected to be "The Most Influential Chinese SemiconductorIndustry Enterprise"
·In Apr. 2006, appraised by SASAC to be Model Enterprise in popularization of Laws
·In Dec. 2006, China's first 300mm polished monocrystal silicon wafer production line was completed and put into practice. In the same year, the company won "2006 Top Ten Beijing Electronic Information Industry
·In Dec. 2006, awarded with "Beijing New Material Engineering Center" by Beijing Municipal People's Government
·In Jan. 2007, appraised as"Year 2006 - the Fastest Growing Enterprise in the Advanced Materials Industry"
·In Mar. 2007, "300mm silicon polished wafer" was name as the Chinese Semiconductor Innovative Products in 2005-2006.
·In Jul. 2007, identified as " Beijing Enterprise Technology Center "
·In Feb. 2008, "150mm heavily arsenic-doped silicon moncrystal and polished wafer" was Named as the Chinese Semiconductor Innovative Products of 2007.
·In Feb. 2008, awarded with the 10 th China Patent Gold Award.
·In Dec. 2008, named as "Top Ten Human Resource Benchmarking Enterprise" by the Zhongguancun Science Park
·In May. 2009, accredited as the first batch of national independent innovation products.
·In Oct. 2009, identified as " National Enterprise Technology Center " by National Development and Reform Commission.
·In Jun. 2011, identified as one of the first "Demonstration enterprise of national technology innovation" by The Ministry of industry and information technology, Ministry of Finance.
·In Apr.2013,GRITEK completed a private placement,offering the primary shareholder,GRINM,60,349,434 shares,and raised RMB 587 million.
·The independent development of gaseous-phase doped 6-inch N-type<100> crystal was successfully conducted in Guotai semiconductor materrials co.,LTD , a subsidiary of GRITEK.It marks a breakthrough progress in gaseous-phase doping technique in 6-inch FZ single crystal.
·In Sept.2013,GRITEK ranked 2nd in the 13th GRINM Sports Meeting,and won the top-10 titles in the contests of parde,broadcaseting gymnastics spiritual civiization,etc.